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類金鋼石薄膜的制備工藝極其光學特性
類金鋼石薄膜的制備工藝極其光學特性
摘 要:本論文采用直流磁控濺射，以Ar為工作氣體濺射高純石墨靶材制備了DLC薄膜。采用AES、UV-VIS等現(xiàn)代化測試手段，通過對薄膜宏觀和微觀結構的分析，研究了制備工藝對DLC薄膜光學性能的影響。以直流磁控濺射法制備了類金剛石薄膜，俄歇電子通過對檢測結果的分析，得到以下結果：
通過測定和計算不同沉積氣壓條件下制備的薄膜的sp2 鍵的百分含量和sp2鍵與sp3鍵比率，發(fā)現(xiàn)沉積氣壓低于0.8Pa時，sp2 鍵的百分含量隨沉積氣壓的增大而減小。采用紫外-可見光透射光譜(UV-VIS)分析了薄膜的光吸收特性和光學帶隙，其光學性質受光學帶隙的直接影響。
關鍵詞：DLC薄膜；俄歇電子能譜；電子結構；光學帶隙；sp2鍵與sp3鍵比率
Preparation craft and optics characteristic of Dianond-like carbon films
Abstract:Diamond-like carbon(DLC) films and DLC:N were prepared by DC reactive magnetron sputtering with Ar as source gases separately, and pure graphite as a target . Based on this, different surface morphology and property of diamond like carbon films was deposited by controlling the deposition pressure,ambient pressure sputtering powers 、working gas and so on. The films studied by AES and UV-VIS to investigate property and electron structure of Diamond-like carbon films. Following conclusions can be made:
The values of ‘D’were used to be calculated the percentage of sp2 hybrid bonds and the ratio of sp2/ sp3. Beyond PAr=0.8pa,these values decrease with the increasing of deposition pressure. The optical transmission and absorption properties, and the optical band gap of the films were characterized by an UV-VIS spectrophotometer. The effects of the sputtering power density and the gas pressure on the optical character and optical band gap of the films were studied. The results indicate that the optical characteristic of the film is affected directly by optical band gap.
Keyword:Diamond-like carbon films；AES; electronic structure；optical band gap；the ratio of sp2 and sp3
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